Centre for Nanosciences and Nanotechnology - Marcoussis Campus
Français Anglais
Central Technological facility > Advanced technologies
image 2
image 3
image 6

Advanced technologies

Trait horizontal

Puce   Nano Imprint Lithography

Puce   Focused Ion Beam patterning


Puce   Central Technological facility

Trait vertical


Besides conventional technologies, LPN is investigating advanced techniques and advanced processing for nanofabrication. For instance, Quantum boxes are grown, either self-organized by MBE, or localized by MOVPE on patterned substrate. STM is developped for atom manipulation. Nano-Imprint Lithography, a promising technique for low-cost and large-scale nanopatterning, and for nanofabrication in the field of life science, was recently developed. Focused Ion Beam patterning can produce ultimate dimensions down to a few nm.

Puce Nano Imprint Lithography

Nano Imprint Lithography

Puce Focused Ion Beam patterning

Focused Ion Beam patterning


Contact         Directory         How to Get to the C2N Marcoussis